中国科学技术大学学报 ›› 2018, Vol. 48 ›› Issue (1): 75-81.DOI: 10.3969/j.issn.0253-2778.2018.01.010

• 论著 • 上一篇    下一篇

全耗尽SOI MOSFET亚阈值表面势的二维半解析模型

常红,孙桂金,杨菲,柯导明*   

  1. 1.安徽大学电子信息工程学院, 安徽合肥 230601; 2.中国电子科技集团有限公司第58研究所,江苏无锡 204000
  • 收稿日期:2017-03-08 修回日期:2017-05-09 出版日期:2018-01-01 发布日期:2018-01-01
  • 通讯作者: 柯导明
  • 作者简介:常红,男,1990年生,博士生,研究方向:半导体器件物理,E-mail:814874822@qq.com
  • 基金资助:
    国家自然科学基金(61376098 ,61076086)资助.

A two dimensional semi-analytical model of sub-threshold surface potential analysis for fully depleted SOI MOSFET

CHANG Hong, SUN Guijin, YANG Fei, KE Daoming*   

  1. 1. School of Electronics and Information Engineering, Anhui University, Hefei 230601, China;
    2. The 58th Research Institute of China Electronics Technology Group Corporation (CETC), Wuxi 204000, China)
  • Received:2017-03-08 Revised:2017-05-09 Online:2018-01-01 Published:2018-01-01

摘要: 根据SOI MOSFET的工作原理,在SOI MOSFET的氧化层、耗尽层和埋氧化层分别引入矩形等效源,提出了电势二维分布的定解问题.再通过半解析法、傅里叶级数展开法和积分法相结合对每个区域的定解问题进行求解,得到了定解问题的二维半解析解,解得结果是无穷级数形式的特殊函数.计算和仿真结果表明,提出的模型求解时精度高,运算量较小,可用于的电路模拟程序.

关键词: SOI MOSFE, 短沟道效应, 电势, 半解析模型

Abstract: Based on the principle of the SOI MOSFT, a definite solution of potential is proposed by introducing three rectangular sources in the oxide layer, depletion layer and buried oxide layer. The potential distribution of the three region has been obtained by means of the variables separation method, Fourier expansion method and the integral method. The solution is a special function of the infinite series expressions. The simulation results show that the proposed semi-analytical model has high precision and smaller calculation and can be applied to circuit simulation programs.

Key words: SOI MOSFET, SCE, potential, semi-analytical model

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