中国科学技术大学学报 ›› 2013, Vol. 43 ›› Issue (2): 143-150.DOI: 10.3969/j.issn.0253-2778.2013.02.009

• 原创论文 • 上一篇    下一篇

磁控溅射制备多孔柱状晶ZrO2薄膜

宁珍珍   

  1. 中国科学技术大学合肥微尺度物质科学国家实验室,安徽合肥 230026
  • 收稿日期:2012-09-21 修回日期:2012-11-09 出版日期:2013-02-28 发布日期:2013-02-28
  • 通讯作者: 谢斌
  • 作者简介:宁珍珍,女,1987年生,硕士. 研究方向:薄膜材料的磁控溅射制备工艺研究. E-mail:ningzhen@mail.ustc.edu.cn
  • 基金资助:
    国家自然科学基金(51072192)资助.

Preparation and characterization of nanoporous columnar ZrO2 films by reactive magnetron sputtering

NING Zhenzhen   

  1. Hefei National Laboratory for Physical Science at Microscale, University of Science and Technology of China,Hefei 230026, China
  • Received:2012-09-21 Revised:2012-11-09 Online:2013-02-28 Published:2013-02-28

摘要: 采用反应磁控溅射倾斜沉积(GLAD)的方法制备了多孔柱状晶的ZrO2薄膜,研究了不同沉积角和靶基距对薄膜结构和光学性质的影响.结果表明,倾斜沉积的ZrO2薄膜具有倾斜的柱状结构,柱状晶之间存在空隙(宽度小于100 nm),平均晶粒大小约为10 nm.沉积角大小的改变在一定程度上可以改变ZrO2薄膜中某些晶粒的取向.增大沉积角和增加靶基距均可使薄膜的折射率减小、孔隙率增大、沉积速率减小,不同的是增大沉积角会增大柱状倾斜角,而增加靶基距会减小柱状倾斜角.沉积角为75°时可制备出折射率为156、孔隙率为417%的ZrO2薄膜.

关键词: 多孔柱状晶, ZrO2薄膜, 倾斜沉积, 磁控溅射

Abstract: Nanoporous columnar ZrO2 films were deposited by reactive magnetron sputtering using glancing angle deposition (GLAD) configuration. The influences of deposition angle and target-substrate distance on the optical and structural properties of ZrO2 films were investigated. It is found that the ZrO2 films fabricated using GLAD show a tilted columnar microstructure; the width of the gap between two adjacent columnar crystals is less than 100 nm; the average grain size of ZrO2 films is about 10 nm; and the orientation of some grains can be changed by changing the deposition angle. In addition, with the increase in the deposition angle or/and target-substrate distance, the porosity of ZrO2 film increases while the refractive index and the deposition rate of ZrO2 film decreases. A larger deposition angle tends to increase the column inclination angle while a longer target-substrate distance tends to decrease the column inclination angle. The refractive index and porosity of ZrO2 films deposited at deposition angle of 75° are 156 and 417%, respectively.

Key words: nanoporous columnar, ZrO2 film, glancing angle deposition, magnetron sputtering