Influence of sputtering parameters on the properties of ZnO:Al films prepared by magnetron sputtering
WU Bingjun
USTC-SHINCRON Joint Lab, Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China, Hefei 230026, China
WU Bingjun, HAO Changshan, LI Ming, XIE Bin. Influence of sputtering parameters on the properties of ZnO:Al films prepared by magnetron sputtering[J]. Journal of University of Science and Technology of China, 2010, 40(10): 991-998.