The patterning of microplasma reactor electrode using sputtering image reversal lift-off process

doi:10.3969/j.issn.0253-2778.2010.04.012

Journal of University of Science and Technology of China ›› 2010, Vol. 40 ›› Issue (4): 400-405.DOI: 10.3969/j.issn.0253-2778.2010.04.012

Previous Articles Next Articles

The patterning of microplasma reactor electrode using sputtering image reversal lift-off process

ZHANG Qiuping

1.Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China,Hefei 230027,China; 2.Department of Mechanical Engineering, Anhui University of Technology and Science, Wuhu 241000,China

Received:2009-04-28 Revised:2009-09-14 Online:2010-04-30 Published:2010-04-30

Abstract

Abstract: The image reversal lift-off process, which is used to pattern the microplasma reactor electrode, is studied. Nickel film is deposited by sputtering and then formed on electrodes using lift-off process based on AR-U4030 photoresist. The effects of reversal bake and develop time on the pattern quality of the photoresist are analysed. Furthermore, the influence of the sputtering power, time and ultrasonic cleaning on the lift-off process are investigated. The thickness of Ni obtained here achieved more than 200 nm and the image resolution is higher than 2 μm.Finally, the inverted square pyramid microplasma reactor is fabricated using this lift-off process, and the electrical characteristic of the reactor operating stably in SF6 is presented.

Key words: sputtering, image reverse, lift-off, microplasma reactor

ZHANG Qiuping, WEN Li, XIANG Weiwei, WANG Hai, CHU Jiaru. The patterning of microplasma reactor electrode using sputtering image reversal lift-off process[J]. Journal of University of Science and Technology of China, 2010, 40(4): 400-405.

[1]	NING Zhenzhen, YU Chuanjie, LI Ming, XIE Bin. Preparation and characterization of nanoporous columnar ZrO2 films by reactive magnetron sputtering [J]. Journal of University of Science and Technology of China, 2013, 43(2): 143-150.
[2]	GAN Liuzhong, WU Bingjun, Huang Feng, LI Ming, XIE Bin. Effects of post-annealing in hydrogen atmosphere on the properties of Al-doped ZnO films [J]. Journal of University of Science and Technology of China, 2010, 40(7): 699-705.
[3]	WU Bingjun, HAO Changshan, LI Ming, XIE Bin. Influence of sputtering parameters on the properties of ZnO:Al films prepared by magnetron sputtering [J]. Journal of University of Science and Technology of China, 2010, 40(10): 991-998.

The patterning of microplasma reactor electrode using sputtering image reversal lift-off process

Knowledge

Abstract

Cite this article

share this article

References

Related Articles 3

Recommended Articles

Metrics

Comments